Chemistry and Biochemistry
Materials chemistry, surface kinetics of metals/semiconductors, CVD, photo-induced deposition, thin-film spectroscopy.
Professor Crowell's research is focused on exploring the surface chemistry of materials, especially the fundamental processes on surfaces that govern chemical reactions, deposition, and thin film formation. His experiments are conducted in ultrahigh vacuum using single crystal metal and semiconductor surfaces, porous semiconductor and oxide materials, and supported metal surfaces. These surfaces are investigated using various surface characterization techniques, including Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), scanning tunneling microscopy (STM), atomic force microscopy (AFM), desorption / reaction mass spectrometry (TPD), and vibrational spectroscopy utilizing electron scattering (HREELS) and reflection or transmission infrared spectroscopy (MIRIRS, RAIRS, and TIRS). Crowell's studies examine the structure, bonding and chemical reactivity of species adsorbed on surfaces, the kinetics of chemical reaction processes at surfaces, and the growth and physical / chemical properties of thin films and interfaces.
B.S. University of Illinois, 1979; Ph.D. University of California, Berkeley, 1984; Postdoctoral Research, University of Pittsburgh, 1984-1986; Regent's Fellowship, University of California, Berkeley, 1981-1982; Merck Award, University of Illinois, 1979; Appointed to faculty 1986-.